Jiangsu Profile
Product List
11071. Semiconductor Grade HCDS Hexachlorodisilane for Atomic Layer Deposition Processes 
[Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11072. Semiconductor ALD CVD Precursor Hexachlorodisilane HCDS CAS 13465-77-5 [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11073. Hexachlorodisilane Supplier HCDS Precursor for Semiconductor ALD and CVD Processes [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11074. Semiconductor Grade Hexachlorodisilane Si2Cl6 for Atomic Layer Deposition and CVD [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11075. Heavy-Duty Hydraulic Guillotine Shear Machine for Precision Metal Cutting [Oct 20, 2026]
[Oct 20, 2026] Mechanical Structure The shearing machine features a fully welded box bed frame integrated with the workbench, providing exceptional stiffness to handle high torque loads efficiently. Its vertical linear movement ...
11076. CNC Hydraulic Metal Shearing Machine for Automatic Precision Cutting [Oct 20, 2026]
[Oct 20, 2026] Mechanical Structure The shearing machine features a fully welded box bed frame integrated with the workbench, providing exceptional stiffness to handle high torque loads efficiently. Its vertical linear movement ...
11077. Barrier Industrial Washer Extractor Machine [Oct 20, 2026]
[Oct 20, 2026] 2023 Latest Isolated Washer Equipment 20kgs Product Description Model BW20 Rated Washing Capacity 15kg Rated Drying Capacity 8kg Basket Volume 157L Wash Compartment 1 Inner Door ...
11078. Advanced Wafer Thinning Grinding Machines for High Precision [Sep 28, 2026]
[Sep 28, 2026] Product Description High precision grinding machine equipment principle: 1. This series of transverse thinning grinding machine is a fully automatic precision grinding equipment. The workpiece is rotated in the ...
11079. HCDS 99 999% Hexachlorodisilane 5N Semiconductor Precursor for ALD CVD LPCVD Processes [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11080. Semiconductor Precursor HCDS 5N Hexachlorodisilane Si2Cl6 for ALD CVD LPCVD [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11081. High Purity HCDS 5N Hexachlorodisilane Semiconductor Precursor for ALD and CVD [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11082. HCDS for CVD LPCVD ALD 5N 99 999% Hexachlorodisilane Semiconductor Precursor [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11083. Semiconductor Grade Hexachlorodisilane HCDS 5N High Purity Precursor for ALD CVD [Oct 22, 2026]
[Oct 22, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
11084. Tungsten Hexafluoride CAS 7783-82-6 Semiconductor Grade CVD Precursor Gas [Oct 19, 2026]
[Oct 19, 2026] Product Description Product Description Tungsten(VI) fluoride, also known as tungsten hexafluoride, is an inorganic compound with the formula WF6. It is a toxic, corrosive, colorless gas, with a density of about 13 g/L ...
11085. Electronic Specialty Tungsten Hexafluoride Gas for Semiconductor CVD Applications [Oct 19, 2026]
[Oct 19, 2026] Product Description Product Description Tungsten(VI) fluoride, also known as tungsten hexafluoride, is an inorganic compound with the formula WF6. It is a toxic, corrosive, colorless gas, with a density of about 13 g/L ...
