Jiangsu Profile
Product List
57601. WF6 Gas CAS 7783-82-6 for Semiconductor Manufacturing Tungsten Film 
[Oct 29, 2026]
[Oct 29, 2026] Product Description Product Description Tungsten(VI) fluoride, also known as tungsten hexafluoride, is an inorganic compound with the formula WF6. It is a toxic, corrosive, colorless gas, with a density of about 13 g/L ...
57602. Tungsten Hexafluoride WF6 Gas for Semiconductor CVD Process High Purity [Oct 29, 2026]
[Oct 29, 2026] Product Description Product Description Tungsten(VI) fluoride, also known as tungsten hexafluoride, is an inorganic compound with the formula WF6. It is a toxic, corrosive, colorless gas, with a density of about 13 g/L ...
57603. WF6,Gas Semiconductor Grade for Tungsten Deposition in CVD Processes [Oct 29, 2026]
[Oct 29, 2026] Product Description Product Description Tungsten(VI) fluoride, also known as tungsten hexafluoride, is an inorganic compound with the formula WF6. It is a toxic, corrosive, colorless gas, with a density of about 13 g/L ...
57604. Ultra High Purity 99.999% 5n Dichlorosilane for Electronics [Oct 29, 2026]
[Oct 29, 2026] Product Descriptions Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films. Product Details Product ...
57605. Premium Electronic Grade Valve for High-Tech Semiconductor Use [Oct 29, 2026]
[Oct 29, 2026] Product Descriptions Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films. Details Product ...
57606. Premium 5n Dichlorosilane for Advanced Electronics and Solar Solutions [Oct 29, 2026]
[Oct 29, 2026] Product Descriptions Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films. Details Product ...
57607. High-Purity 5n Dichlorosilane - 99.999% Grade for Semiconductor Use [Oct 29, 2026]
[Oct 29, 2026] Product Descriptions Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films. Details Product ...
57608. 99.999% Pure Dichlorosilane for Electronics and Tech Industries [Oct 29, 2026]
[Oct 29, 2026] Product Descriptions Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films. Details Product ...
57609. Superior Electronic Grade Dichlorosilane 99.999% for Global Supply [Oct 29, 2026]
[Oct 29, 2026] Product Descriptions Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films. Details Product ...
57610. Ultra High Purity Tma for Advanced CVD and Ald Processes [Oct 29, 2026]
[Oct 29, 2026] Specification Element Max Si < 1.0 ppm Fe < 0.1 ppm Cu < 0.15 ppm Zn < 0.2 ppm Na + K < 0.1 ppm Mg + Ca < 0.2 ppm KAIMEI's Electronic Grade TMA Production & QC Workflow KAIMEI Electronic Gases ensures zero-defect ALD ...
57611. Trimethylaluminum for Electronic Grade Ald with 99 999% Purity [Oct 29, 2026]
[Oct 29, 2026] Specification Element Max Si < 1.0 ppm Fe < 0.1 ppm Cu < 0.15 ppm Zn < 0.2 ppm Na + K < 0.1 ppm Mg + Ca < 0.2 ppm KAIMEI's Electronic Grade TMA Production & QC Workflow KAIMEI guarantees zero-defect ALD quality for ...
57612. Tma Manufacturer Providing 99 999% Ultra High Purity Trimethylaluminum [Oct 29, 2026]
[Oct 29, 2026] Specification Element Max Si < 1.0 ppm Fe < 0.1 ppm Cu < 0.15 ppm Zn < 0.2 ppm Na + K < 0.1 ppm Mg + Ca < 0.2 ppm KAIMEI's Electronic Grade TMA Production & QC Workflow KAIMEI Electronic Gases ensures defect-free ALD ...
57613. Electronic Grade Trimethylaluminum for Atomic Layer Deposition Applications [Oct 29, 2026]
[Oct 29, 2026] Specification Element Max Si < 1.0 ppm Fe < 0.1 ppm Cu < 0.15 ppm Zn < 0.2 ppm Na + K < 0.1 ppm Mg + Ca < 0.2 ppm KAIMEI's Electronic Grade TMA Production & QC Workflow KAIMEI Electronic Gases ensures zero-defect ALD ...
57614. High Purity Tma Precursor for Advanced CVD Processes and Applications [Oct 29, 2026]
[Oct 29, 2026] Specification Element Max Si < 1.0 ppm Fe < 0.1 ppm Cu < 0.15 ppm Zn < 0.2 ppm Na + K < 0.1 ppm Mg + Ca < 0.2 ppm KAIMEI's Electronic Grade TMA Production & QC Workflow KAIMEI Electronic Gases ensures zero-defect ALD ...
57615. Superior Quality 5n Dichlorosilane 99.999% for Electronics Supply [Oct 29, 2026]
[Oct 29, 2026] Product Descriptions Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films. Product Details Product ...
