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3346. Mops Sodium Salt (MOPS-Na) CAS No.: 71119-22-7 High Quality Good Price 
[Jul 02, 2025]
[Jul 02, 2025] Product Description Product Detail Name: MOPS sodium salt (MOPS-Na) CAS No.: 71119-22-7- Molecular Formula: C7H14NNaO4S Molecular Weight: 231.25 EINECS: 1533716-785-6 Composition: Purity≥99% Loss on ...
Company: Puyer Biopharma Ltd.
3347. 3- ((3-Cholamidopropyl)dimethylammonium) -1-Propanesulfonate CAS No.: 75621-03-3 [Jun 30, 2025]
[Jun 30, 2025] Product Description Product Detail Name: 3-((3-Cholamidopropyl)dimethylammonium)-1-propanesulfonate CAS No.: 75621-03-3 Molecular Formula: C32H58N2O7S Molecular Weight: 614.88 EINECS: ...
Company: Puyer Biopharma Ltd.
![N-[Tris (hydroxymethyl) Methyl]-3-Aminopropanesulfonic Acid Sodium Salt CAS No.: 91000-53-2](http://image.made-in-china.com/3f2j00QgWUVSNhVurt/N-Tris-hydroxymethyl-Methyl-3-Aminopropanesulfonic-Acid-Sodium-Salt-CAS-No-91000-53-2.jpg)
3348. N-[Tris (hydroxymethyl) Methyl]-3-Aminopropanesulfonic Acid Sodium Salt CAS No.: 91000-53-2 [Jun 30, 2025]
[Jun 30, 2025] Product Description Product Detail Name: N-[Tris(hydroxymethyl)methyl]-3-aminopropanesulfonic acid sodium salt CAS No.: 91000-53-2 Molecular Formula: C7H16NNaO6S Molecular Weight: 265.26 EINECS: ...
Company: Puyer Biopharma Ltd.
3349. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3350. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3351. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3352. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3353. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3354. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3355. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3356. Ultra High Purity 99.999% Ammonia Gas for Industrial Use [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Package Specifications: Package Volume Weight Valve connection Cylinder 47L 20KG CGA660,DISS720 Y-CYL 440L 230KG DISS ...
3357. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 < 0.5 0.1 0.01 N2(VOF)/10-6 < 1 - 0.01 CO(VOF)/10-6 ...
3358. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3359. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
3360. High Purity Ammonia 99.999% 5n Gas [Jun 16, 2025]
[Jun 16, 2025] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
